Thermal Evaporation System

Technical and Characterization Specifications:

• It is an thin film deposition
• The source material evaporated in a vacuum
• In high vacuum evaporated particles can travel directly to the deposition target without colliding with the background gas
• Backing pump Pressure : 5*10-2
• Roughing Pressure         : 5*10-2
• Turbo controller in pennigauge - 1*10-6
• Quartz crystal is used to monitor the thickness of the deposited film and also to control the rate of evaporation
• Temperature range : 250 K
• Primary Current range: 0.81
• Typical filament currents are 100-200Amps
• Nitogen gas are used
• Heating filaments/boats : Tungsten, molybdenum
• Maximum deposition thickness that can be achieved is 600nm.
• Substrate temperature can be increased up to 150oC .