Table Top Sputtering System: [Make : Hind High Vacuum, ,INDIA]

Technical and Characterization Specifications:

• Control system: Integrated PLC with colour touch screen.
• Chamber: Glass cylinder 300 mm diameters x 150mm tall with implosion guard. 200mm tall option
• Vacuum performance (rotary pump): 5x10-2mbar in <12 minutes
• Vacuum performance (turbo pump): 5x10-5mbar in <20 minutes
• Metal sputtering: 2 targets for sequential deposition. DC sputter power supply and switching system
• It is a dual magnetron Gold and Titanium.
• Gold Current: 60mA
• Titanium Current: 150mA
• Crystal holder: 2-target systems have 2 crystal monitor heads.
• Process gas admission: Single channel pressure control system with chamber purge facility.