Reactive Ion Etching System [RIE] : [Make: Hind High vacuum, INDIA]
- It is a directional etching process utilizing ion bombardment to remove metals/material
- Plasma is produced in the system by applying a strong RF [Radio frequency] electromagnetic filed to the electrode
- Frequency range : 13.56 MHz
- Vacuum reached at : 1 *10 -3
- Argon, Oxygen, CF4 and SF6 Gases can be used for etching
