Seminar on Advanced measurement techniques with the CSI Nano Observer scanning probe microscope
2016-04-07 15:30 (Indian/Mahe) | LECTURE HALL
Advanced measurement techniques with the CSI Nano Observer scanning probe microscope
by
Dr Kunal Bose
Senior Applications Specialist & General Manager
APAC, CS Instruments
France
on
Thursday, 7 April 2016
Time: 3.30 P.M.
Venue: Lecture Hall

Dr Kunal Bose, Senior Applications Specialist & General Manager APAC, CS Instruments, France

Recent advances in scanning technology and digital control electronics have resulted in scanning probe microscopy techniques evolving as more affordable research tools. The CSI Nano Observer? SPM platform uses state of the art low voltage piezo scanning technology and high performance 24 bit digital control electronics to achieve research grade performance. In addition, the proprietary ResiScope II? is a unique system able to measure Resistance over 10 decades with a high sensitivity and resolution. It can be combined with several dynamic modes as MFM/EFM or KFM single pass providing several sample characterizations on the same scan area.

The talk will focus on advanced electrical, magnetic & thermal characterization scanning probe techniques such as HD KFM, MLFM, soft Resiscope etc through a number of illustrative measurements obtained on a wide range of samples.

About the speaker:

Kunal is an experienced nano instrumentation specialist and prior to joining CSI led Agilent Technologies? nanomeasurements business in South Asia. Prior to Agilent, he was an applications specialist with Veeco nanotechnology (now Bruker Nano). Kunal holds Bachelors & PhD degrees from IIT Kharagpur & Southampton University, UK respectively and was a postdoctoral fellow at Leeds (UK) & Columbia University (US).
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